Method for determining height of insulating layer in shallow trench

浅沟槽内绝缘层高度的确定方法

Abstract

一种浅沟槽内绝缘层高度的确定方法,包括下列步骤:提供绝缘层高度不同的浅沟槽隔离结构,在浅沟槽隔离结构上横跨有栅极;在栅极上加固定值的电压,测量浅沟槽隔离结构上电场;将最小电场值对应的浅沟槽内绝缘层高度选定为最佳值。本发明通过在栅极上加固定值电压后,得到器件宽度方向上浅沟槽结构的电场分布与浅沟槽内绝缘层高度的关系。选取最佳的绝缘层高度,能使浅沟槽边缘的凹陷程度最佳,产生的结漏电最小;并且对沟道中的电场分布影响最小。
A method for determining the height of an insulating layer in a shallow trench comprises the following steps: providing shallow trench isolating structures with different insulating layer heights, and spanning grids on the shallow trench isolating structures; applying voltage with fixed values on the grids and measuring electric fields on the shallow trench isolating structures; and selecting the height of the insulating layer in the shallow trench corresponding to the minimum electric field value to be an optimal value. In the method for determining the height of the insulating layer in the shallow trench, after the voltage with the fixed values is applied, relationships between the electric field distribution of the shallow trench structures in the width direction of a device and the heights of the insulating layers in the shallow trench are obtained. The optimal height of the insulating layer is selected so as to make the hollowed degree of edges of the shallow trench optimal and to obtain the minimum junction leakage; and the electric field distribution in the trench is influenced minimally.

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